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Wettability of plasma-polymerized vinyltriethoxysilane film
Lichovníková, Soňa, Studýnka, Jan and Čech, Vladimír Wettability of plasma-polymerized vinyltriethoxysilane film Chemical Papers, Vol.63, No. 4, 2009, 479-483
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Document type:
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Článok z časopisu / Journal Article |
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Collection:
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Chemical papers
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| Author(s) |
Lichovníková, Soňa
Studýnka, Jan
Čech, Vladimír
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| Title |
Wettability of plasma-polymerized vinyltriethoxysilane film
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| Journal name |
Chemical Papers
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| Publication date |
2009
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| Year available |
2009
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| Volume number |
63
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| Issue number |
4
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| ISSN |
0366-6352
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| Start page |
479
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| End page |
483
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| Place of publication |
Poland
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| Publisher |
Versita
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| Collection year |
2009
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| Language |
english
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| Subject |
250000 Chemical Sciences
250500 Macromolecular Chemistry
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| Abstract/Summary |
Plasma-polymerized films of vinyltriethoxysilane were surface characterized using the sessile drop technique. The surface free energy and its components were evaluated using the Owens-Wendt-Kaelble geometric mean method, Wu harmonic mean method, and van Oss, Chaudhury, and Good acid-base theory. Influence of deposition conditions on the surface free energy was demonstrated in the study. Improved wettability of the films was related to the diminished concentration of apolar methyl groups in plasma polymers. An increased concentration of carbonyl and hydroxyl groups resulted in a very small improvement of the polar component.
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